In the complex process of chip manufacturing, photolithography machines occupy a core position and are known as the "crown jewel of the semiconductor industry". As a key link in chip manufacturing, photolithography uses optical technology to accurately project fine circuit patterns onto silicon wafers, opening the key steps of chip manufacturing. In this precision equipment, optical components are its "soul component" and play an irreplaceable and important role. ​

A variety of key optical components are used in photolithography machines, including lenses, cylindrical lenses, spherical lenses, and prisms. These components are crucial in controlling the thickness of the photoresist layer. In the chip and liquid crystal display manufacturing process, the accuracy of the photoresist layer thickness is directly related to manufacturing accuracy, resolution, and cost. Optical products can achieve precise control of the thickness of the photoresist layer with their unique optical design. At the same time, lenses, spherical lenses, etc. can also help photolithography machines achieve higher resolution and accuracy requirements by optimizing optical design and improving optical path clarity, meeting the stringent standards of photolithography machines for shrinking wafer sizes.​

Diffractive optical elements are also an important role in lithography machines. They are composed of a series of movable lenses. The light source part of a lithography machine is equipped with about 4,000 lenses. DOE can accurately control the light intensity distribution while maintaining a high diffraction efficiency, and is an ideal element for off-axis illumination. However, after the light passes through the diffractive optical element, multiple diffraction orders will be generated. In addition to the main diffraction order light, other orders of light will form stray light on the main diffraction order image plane, reducing the image plane contrast, so its diffraction efficiency has a significant impact on the image quality. ​

In addition, the objective lens group in the exposure system of the lithography machine is also indispensable. The objective lens set is usually composed of 20-30 lenses, and in order to ensure the consistency of the optical path, only products from a single supplier are often used. The homogenizer rod, integrator rod, microprism in the illumination system, and the positioning grating in the measurement system are also important components of the optical system of the lithography machine. It is estimated that the optical system accounts for 30-40% of the cost of the lithography machine.​

Optical components have an all-round impact on the performance of lithography machines. On the one hand, optical components directly determine the resolution of lithography machines. The higher the resolution, the smaller the chip manufacturing size and the better the performance. For example, ASML lithography machines use ultra-smooth reflectors produced by Zeiss in Germany to achieve extremely high resolution, laying a solid foundation for high-end chip manufacturing. On the other hand, optical components affect the light intensity and stability of lithography machines. When working, lithography machines need to generate high-intensity light sources, which are reflected, shaped and filtered by optical components. If the quality of optical components is poor, it is easy to cause problems such as insufficient light intensity and poor stability, which seriously affect the quality of chip manufacturing. ​

Optical components play a core role in lithography machines. Their performance is directly related to the overall performance of lithography machines, and thus determines the accuracy and quality of chip manufacturing. As the semiconductor industry continues to develop towards higher precision and smaller size, the research and development and innovation of optical components will continue to inject strong impetus into the technological progress of lithography machines.